Computer Intensive Problems in Simulation of Integrated Circuit Lithography and Topography - Robotics Institute Carnegie Mellon University

Computer Intensive Problems in Simulation of Integrated Circuit Lithography and Topography

A. R. Neureuther and Owen Carmichael
Workshop Paper, Proceedings NASA AMES Workshop, March, 1996

BibTeX

@workshop{Neureuther-1996-14091,
author = {A. R. Neureuther and Owen Carmichael},
title = {Computer Intensive Problems in Simulation of Integrated Circuit Lithography and Topography},
booktitle = {Proceedings NASA AMES Workshop},
year = {1996},
month = {March},
}
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